Inductive crystallization effect of atomic-layer-deposited Hf0.5Zr0.5O2 films for ferroelectric application

Atomic layer deposition of high-density Pt nanodots on Al2O3 film using (MeCp)Pt(Me)3 and O2 precursors for nonvolatile memory applications

(2013) Shi-Jin Ding et al.   Nanoscale Research Letters

Optical and microstructural properties of ZnO/TiO2 nanolaminates prepared by atomic layer deposition

(2013) Yu-Zhu Gu et al.   Nanoscale Research Letters

High-performance bilayer flexible resistive random access memory based on low-temperature thermal atomic layer deposition

(2013) Run-Chen Fang et al.   Nanoscale Research Letters

Incipient Ferroelectricity in Al-Doped HfO2 Thin Films

(2012) Stefan Mueller et al.   ADVANCED FUNCTIONAL MATERIALS

Nanosecond Polarization Switching and Long Retention in a Novel MFIS-FET Based on Ferroelectric $\hbox{HfO}_{2}$

(2012) Johannes Muller et al.   IEEE ELECTRON DEVICE LETTERS

Ferroelectricity in hafnium oxide thin films

(2011) T. S. Böscke et al.   APPLIED PHYSICS LETTERS

Ferroelectric Zr0.5Hf0.5O2thin films for nonvolatile memory applications

(2011) J. Müller et al.   APPLIED PHYSICS LETTERS

Ferroelectricity in yttrium-doped hafnium oxide

(2011) J. Müller et al.   JOURNAL OF APPLIED PHYSICS

Physical and Electrical Properties of Hafnium–Zirconium–Oxide Films Grown by Atomic Layer Deposition

(2008) Seokhwan Bang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY