Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering

Title
Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering
Authors
Keywords
-
Journal
AIP Advances
Volume 5, Issue 1, Pages 017136
Publisher
AIP Publishing
Online
2015-01-24
DOI
10.1063/1.4906796

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