Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering
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Title
Influence of substrate temperature on the crystalline quality of AlN layers deposited by RF reactive magnetron sputtering
Authors
Keywords
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Journal
AIP Advances
Volume 5, Issue 1, Pages 017136
Publisher
AIP Publishing
Online
2015-01-24
DOI
10.1063/1.4906796
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Related references
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