Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications

Title
Direct Fabrication of Hexagonally Ordered Ridged Nanoarchitectures via Dual Interference Lithography for Efficient Sensing Applications
Authors
Keywords
-
Journal
Small
Volume 10, Issue 8, Pages 1490-1494
Publisher
Wiley
Online
2013-12-19
DOI
10.1002/smll.201302860

Ask authors/readers for more resources

Create your own webinar

Interested in hosting your own webinar? Check the schedule and propose your idea to the Peeref Content Team.

Create Now

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started