Nanomechanical Analysis of Etched Si Surface for Adaptively Coupled Plasma Etching System for Sub-20 nm SADP Process Applications

Published 2015 View Full Article

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Title
Nanomechanical Analysis of Etched Si Surface for Adaptively Coupled Plasma Etching System for Sub-20 nm SADP Process Applications
Authors
Keywords
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Journal
Science of Advanced Materials
Volume 7, Issue 1, Pages 133-138
Publisher
American Scientific Publishers
Online
2015-01-15
DOI
10.1166/sam.2015.2092

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