Nanomechanical Analysis of Etched Si Surface for Adaptively Coupled Plasma Etching System for Sub-20 nm SADP Process Applications

出版年份 2015 全文链接

标题

Nanomechanical Analysis of Etched Si Surface for Adaptively Coupled Plasma Etching System for Sub-20 nm SADP Process Applications

作者

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出版物

Science of Advanced Materials

Volume 7, Issue 1, Pages 133-138

出版商

American Scientific Publishers

发表日期

2015-01-15

DOI

10.1166/sam.2015.2092

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