Atomic layer deposition of ruthenium on plasma-treated vertically aligned carbon nanotubes for high-performance ultracapacitors
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Title
Atomic layer deposition of ruthenium on plasma-treated vertically aligned carbon nanotubes for high-performance ultracapacitors
Authors
Keywords
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Journal
NANOTECHNOLOGY
Volume 25, Issue 43, Pages 435404
Publisher
IOP Publishing
Online
2014-10-09
DOI
10.1088/0957-4484/25/43/435404
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