A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography

Published 2012 View Full Article

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Title
A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography
Authors
Keywords
-
Journal
LANGMUIR
Volume 28, Issue 31, Pages 11546-11554
Publisher
American Chemical Society (ACS)
Online
2012-07-11
DOI
10.1021/la300256k

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