A Simulation Study on the Effect of Cross-Linking Agent Concentration for Defect Tolerant Demolding in UV Nanoimprint Lithography

出版年份 2012 全文链接

标题

作者

关键词

出版物

Volume 28, Issue 31, Pages 11546-11554

出版商

American Chemical Society (ACS)

发表日期

2012-07-11

DOI

10.1021/la300256k

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