Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas

Title
Surprising importance of photo-assisted etching of silicon in chlorine-containing plasmas
Authors
Keywords
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Journal
JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A
Volume 30, Issue 2, Pages 021306
Publisher
American Vacuum Society
Online
2012-02-07
DOI
10.1116/1.3681285

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