Atomic Layer Deposition of Tantalum-Incorporated Hafnium Dioxide: Strategies to Enhance Thermal Stability

Optical properties of La-incorporated HfO2 upon crystallization

(2011) Tuo Wang et al.   APPLIED PHYSICS LETTERS

Structure versus Thermal Stability: The Periodic Structure of Atomic Layer Deposition-Grown Al-Incorporated HfO2Films and Its Effects on Amorphous Stabilization

(2011) Tuo Wang et al.   CHEMISTRY OF MATERIALS

Subnanoscale Lanthanum Distribution in Lanthanum-Incorporated Hafnium Oxide Thin Films Grown Using Atomic Layer Deposition

(2010) Tuo Wang et al.   CHEMISTRY OF MATERIALS

Fabrication and characterization of La-doped HfO2 gate dielectrics by metal-organic chemical vapor deposition

(2009) Liu-Ying Huang et al.   APPLIED SURFACE SCIENCE

Atomic Layer Deposition of Lanthanum Stabilized Amorphous Hafnium Oxide Thin Films

(2009) Tuo Wang et al.   CHEMISTRY OF MATERIALS

Structural phase transformation of Y2O3 doped HfO2 films grown on Si using atomic layer deposition

(2009) Prodyut Majumder et al.   JOURNAL OF APPLIED PHYSICS

Suppression of near-edge optical absorption band in sputter deposited HfO2–Al2O3 nanolaminates containing nonmonoclinic HfO2

(2008) E. E. Hoppe et al.   APPLIED PHYSICS LETTERS

Process and Material Properties of HfLaO[sub x] Prepared by Atomic Layer Deposition

(2008) Wei He et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

First-principles study on doping and phase stability ofHfO2

(2008) Choong-Ki Lee et al.   PHYSICAL REVIEW B