Article
Thermodynamics
Linfeng Zhang, Yongjie Zhang, Bing Wu, Hui Deng
Summary: In this study, atmospheric argon inductively coupled plasma (Ar-ICP) was applied to the thermal etching of GaN for the first time. The etching principle and mechanism of circular etching pit formation were revealed through the analysis of surface chemical composition and near-surface plasma spectroscopy. The maximum material removal rate of Ar-ICP thermal etching can reach 18.72 gm/min. The optical properties of the sliced GaN after the Ar-ICP thermal etching and lapping process were evaluated by photoluminescence (PL), showing increased PL intensity and red shift in the near-band emission peak position compared to the lapped sample.
THERMOCHIMICA ACTA
(2023)
Article
Physics, Applied
Shinji Yamada, Hideki Sakurai, Yamato Osada, Kanji Furuta, Toshiyuki Nakamura, Ryuichiro Kamimura, Tetsuo Narita, Jun Suda, Tetsu Kachi
Summary: A dry-etching technique using inductively coupled plasma reactive ion etching (ICP-RIE) was developed to form an optimal trench shape with highly vertical sidewalls and rounded corners, with SiCl4 reactive gas mixed with Cl-2 gas contributing to the highly vertical trench formation. The optimization of bias power was key to suppressing the formation of subtrenches and achieving natural formation of rounded corners. Multistep-bias etching technique was applied to reduce etching-induced damage, showing promising results for GaN-based vertical T-MOSFETs.
APPLIED PHYSICS LETTERS
(2021)
Article
Physics, Multidisciplinary
Xiaoming Ge, Xuebing Yin, Qiaoyu Zeng, Qi Feng, Xiaohui Wang, Quantong Li, Zhitao Chen, Chengguo Li
Summary: This study reports the Cl-based inductively coupled plasma etching of N-polar Al(Ga)N layers and its effects on the surface quality. The results show that debris appeared on the etched N-polar surface, while the etched Al-/Ga-polar surface remained clean and smooth. Chemical analysis suggests that the debris is the result of Cl-related byproducts generated during the etching process. The formation and disappearance of debris are attributed to the formation of Al(Ga)Cl-x byproducts.
FRONTIERS IN PHYSICS
(2022)
Article
Optics
Jinhai Sun, Yan Zheng, Jielin Shi, Yarui Zhao, Yu Li, Ding Wu, He Cai, Xutao Zhang, Xianli Zhu, Yongqiang Liu, Xinxue Sun, Zengming Chao, Hongcheng Yin, Wenqi Lu, Hongbin Ding
Summary: The electron density distribution of inductively coupled plasma (ICP) was measured using laser Thomson scattering (TS) method and simulated using finite element method (FEM). The accuracy of the ICP generation simulation model was verified by comparing the simulated and experimental results. The propagation characteristics of terahertz wave in ICP were measured using terahertz time domain spectroscopy (THz-TDS) and calculated using FEM, showing high consistency between experimental and simulation results. This further proves the accuracy of the terahertz wave transmission model in plasma and the feasibility of joint simulation with ICP generation simulation model.
Article
Biochemical Research Methods
Shaun T. Lancaster, Thomas Prohaska, Johanna Irrgeher
Summary: This study proposes the use of nitrous oxide (N2O) as a non-corrosive and non-toxic alternative for calcium isotope analysis. Instrument performance testing shows that N2O can achieve equivalent detection limits and background concentrations compared to traditional gases. Further testing with synthetic standards highlights N2O's advantage in separating interferences from potassium and magnesium.
ANALYTICAL AND BIOANALYTICAL CHEMISTRY
(2022)
Article
Materials Science, Multidisciplinary
Jong-Hyeon Shin, Yong-Hyun Kim, Jong-Bae Park, Dae-Chul Kim, Young-Woo Kim, Jong-Sik Kim, Jung-Sik Yoon
Summary: In this study, the nitridation of silicon oxide film surfaces using an inductively coupled plasma source was investigated. The plasma parameters and nitride film characteristics were measured and analyzed under different nitrogen gas pressures and radio frequency power levels. The correlation between nitridation rate and process parameters was studied.
Article
Nanoscience & Nanotechnology
Sang-Woo Kim, Ju-Hong Cha, Sung-Hyeon Juing, SeungBo Shim, Chang Ho Kim, Ho-Jun Lee
Summary: This study proposes a novel inductively coupled plasma (ICP) system consisting of a segmented dielectric window and a metal frame. The thin window design compensates for power loss caused by the metal frame, enhancing the controllability of the gas flow field and reducing capacitive power coupling. Three-dimensional fluid self-consistent plasma simulations and experiments confirm the superior uniformity and reliability of the proposed ICP system for semiconductor processes, comparable to conventional ICP systems used in etching and deposition.
Article
Chemistry, Physical
Dain Sung, Long Wen, Hyunwoo Tak, Hyejoo Lee, Dongwoo Kim, Geunyoung Yeom
Summary: The etching properties of C6F6/Ar/O-2 in ICP and CCP systems were evaluated. In the ICP system, lower O-2/C6F6 ratio and higher SiO2 etch rate were required, while in the CCP system, tapered SiO2 etch profiles were observed.
Article
Physics, Fluids & Plasmas
Ju Ho Kim, Chin-Wook Chung
Summary: Investigation on the plasma and electrical characteristics in an inductively coupled plasma with different antenna positions was conducted. The ion density at resonance is significantly higher in setup A compared to non-resonance, whereas there is no significant difference in setup B. The difference is analyzed and discussed with respect to electron kinetics effect and antenna-metal plate coupling loss.
PLASMA SOURCES SCIENCE & TECHNOLOGY
(2022)
Review
Chemistry, Multidisciplinary
Philip A. Doble, Raquel Gonzalez de Vega, David P. Bishop, Dominic J. Hare, David Clases
Summary: Elemental imaging provides insights into the chemical composition of living organisms, with potential applications in understanding disease states. Laser ablation-inductively coupled plasma-mass spectrometry (LA-ICP-MS) has emerged as a principal elemental imaging technique for biologists.
Article
Chemistry, Physical
Hu Luo, Khan Muhammad Ajmal, Wang Liu, Kazuya Yamamura, Hui Deng
Summary: This study focused on highly efficient and damage-free diamond polishing enhanced by atmospheric pressure inductively coupled plasma (ICP) modified silicon plate. The results showed a significant decrease in surface roughness and the achievement of an atomically smooth, high-quality diamond surface.
Article
Materials Science, Multidisciplinary
Yipeng Chang, Xiaolong Wei, Xinmin Han, Haojun Xu, Mao Lin, Binbin Pei, Lin Zhang
Summary: A new honeycomb absorbing superimposed structure based on inductively coupled plasma (ICP) is proposed in this study. The structure can be adjusted by external conditions such as RF power, pressure and cavity thickness of ICP, achieving excellent absorption performance and broadband characteristics. Simulation and experimental results show that increasing RF power and pressure can improve absorption effect of the structure, and changing cavity thickness can alter absorption frequency band and reflectivity.
Article
Chemistry, Analytical
Annika Schardt, Johannes Schmitt, Carsten Engelhard
Summary: In this proof-of-principle study, a new data acquisition system with nanosecond time resolution (nanoDAQ) and a matching data processing approach were developed for single particle inductively coupled plasma mass spectrometry (spICP-MS). The system can detect gold nanoparticles as small as 7.5 nm and acquire a statistically significant number of data points in a short time.
JOURNAL OF ANALYTICAL ATOMIC SPECTROMETRY
(2023)
Article
Nanoscience & Nanotechnology
Chad A. Beaudette, Himashi P. Andaraarachchi, Chi-Chin Wu, Uwe R. Kortshagen
Summary: By using an inductive nonthermal plasma reactor fed with aluminum trichloride and Ar, single-crystal aluminum nanoparticles were synthesized with different reactor conditions affecting properties like oxide shell thickness, particle mono-dispersity, and particle size. Large quantities of Ar relative to AlCl3, short residence times, and high pressures are needed to form 10-20 nm Al particles with low geometric standard deviations.
Article
Automation & Control Systems
Junjie Wang, Yanming Liu, Xiaotao Liu, Xiaoping Li, Haojie Zhang, Di Wang
Summary: A novel robust tuning approach based on model-predictive control for an inductively coupled plasma generation process is presented in this article. The methodology involves modeling the process, developing a robust joint tuning algorithm, and semiphysical simulation of the MPC algorithm. The proposed approach aims to minimize the total variations in the output of the ICP generation control system while balancing dynamic performance and robustness.
IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS
(2021)