A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)

Title
A “thiol-ene” photo-curable hybrid fluorinated resist for the high-performance replica mold of nanoimprint lithography (NIL)
Authors
Keywords
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Journal
JOURNAL OF MATERIALS CHEMISTRY
Volume 22, Issue 6, Pages 2616-2623
Publisher
Royal Society of Chemistry (RSC)
Online
2011-12-20
DOI
10.1039/c1jm13765d

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