A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol-Ene System
Published 2011 View Full Article
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Title
A Nanoimprint Lithography Hybrid Photoresist Based on the Thiol-Ene System
Authors
Keywords
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Journal
ADVANCED FUNCTIONAL MATERIALS
Volume 21, Issue 15, Pages 2960-2967
Publisher
Wiley
Online
2011-06-03
DOI
10.1002/adfm.201100692
References
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