Texture and microstructure evolution in single-phase TixTa1−xN alloys of rocksalt structure

Reactive magnetron cosputtering of hard and conductive ternary nitride thin films: Ti–Zr–N and Ti–Ta–N

(2010) G. Abadias et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

(2010) M. Lattemann et al.   THIN SOLID FILMS

Plasma energy and work function of conducting transition metal nitrides for electronic applications

(2009) G. M. Matenoglou et al.   APPLIED PHYSICS LETTERS

Reactive sputter deposition of TiN layers: modelling the growth by characterization of particle fluxes towards the substrate

(2009) S Mahieu et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

A structure zone diagram including plasma-based deposition and ion etching

(2009) André Anders   THIN SOLID FILMS

Structure, elastic properties and phase stability of Cr1–xAlxN

(2008) P.H. Mayrhofer et al.   ACTA MATERIALIA

Organometallic vapor phase epitaxial growth of GaN on ZrN∕AlN∕Si substrates

(2008) Mark H. Oliver et al.   APPLIED PHYSICS LETTERS

Conducting transition metal nitride thin films with tailored cell sizes: The case of δ-TixTa1−xN

(2008) L. E. Koutsokeras et al.   APPLIED PHYSICS LETTERS

Stress and preferred orientation in nitride-based PVD coatings

(2007) G. Abadias   SURFACE & COATINGS TECHNOLOGY