H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics

Title
H2/N2 plasma damage on porous dielectric SiOCH film evaluated by in situ film characterization and plasma diagnostics
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 109, Issue 8, Pages 084112
Publisher
AIP Publishing
Online
2011-04-23
DOI
10.1063/1.3562161

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