Structure-designable method to form super low-kSiOC film (k= 2.2) by neutral-beam-enhanced chemical vapour deposition

Published 2009 View Full Article

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Title
Structure-designable method to form super low-kSiOC film (k= 2.2) by neutral-beam-enhanced chemical vapour deposition
Authors
Keywords
-
Journal
JOURNAL OF PHYSICS D-APPLIED PHYSICS
Volume 42, Issue 5, Pages 055208
Publisher
IOP Publishing
Online
2009-02-19
DOI
10.1088/0022-3727/42/5/055208
References
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