Article
Engineering, Electrical & Electronic
C. Liu, Y. Q. Chen, Y. Liu, P. Lai, Z. Y. He, Y. F. En, T. Y. Wang, Y. Huang
Summary: This work investigates the degradation behavior and physical mechanism of AIGaN/GaN HEMTs under hot-electron stress in hydrogen and nitrogen atmosphere, showing that degradation in hydrogen atmosphere is more severe. Experimental results and COMSOL finite-element simulations support this conclusion.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2021)
Article
Computer Science, Information Systems
Wei Lin, Maojun Wang, Haozhe Sun, Bing Xie, Cheng P. Wen, Yilong Hao, Bo Shen
Summary: This paper proposes an HEMT structure with a source-connected p-GaN embedded in a carbon-doped semi-insulating buffer to suppress the buffer-induced current collapse effect. Two-dimensional transient simulation demonstrates the successful suppression of current collapse in SCPG-HEMTs compared to conventional HEMTs. The mechanism of ejecting holes from SCPG into the high resistive buffer layer after off-state stress is illustrated to potentially solve the buffer-induced degradation of dynamic on-resistance in GaN power devices.
Article
Engineering, Electrical & Electronic
Md. Tasnim Azad, Toiyob Hossain, Bejoy Sikder, Qingyun Xie, Mengyang Yuan, Eiji Yagyu, Koon Hoo Teo, Tomas Palacios, Nadim Chowdhury
Summary: This work proposes a multimetal gated architecture to improve the linearity of AlGaN/GaN HEMT. Through experimental and simulation analysis, it is found that using different gate metals can reduce the value of third-order transconductance. The proposed device exhibits better compression point, saturation output power, and power added efficiency, and shows excellent linearity performance under deep class AB bias.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2023)
Article
Physics, Multidisciplinary
Peng Zhang, Miao Li, Jun-Wen Chen, Jia-Zhi Liu, Xiao-Hua Ma
Summary: This paper proposes a self-supporting T-shaped gate (SST-gate) GaN device and process using electron beam lithography. An AlGaN/GaN high-electron-mobility transistor (HEMT) device with a gate length of 100 nm is fabricated by this method. The device achieves a current gain cutoff frequency (f (T)) of 60 GHz and a maximum oscillation frequency (f (max)) of 104 GHz. Compared with the traditional floating T-shaped gate (FT-gate) device, the current collapse improves by 13% at a static bias of (V (GSQ), V (DSQ)) = (-8 V, 10 V), and the gate manufacturing yield improves by 17%.
Article
Engineering, Electrical & Electronic
Deepthi Cingu, Xiangdong Li, Benoit Bakeroot, Nooshin Amirifar, Karen Geens, Kristof J. P. Jacobs, Ming Zhao, Shuzhen You, Guido Groeseneken, Stefaan Decoutere
Summary: This study provides a comprehensive evaluation of the reliability of 200V HEMTs in reverse conduction mode, revealing that p-GaN gate HEMTs exhibit high reliability in reverse conduction, which can simplify the design of synchronous power systems.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2021)
Article
Engineering, Electrical & Electronic
Yuji Ando, Ryutaro Makisako, Hidemasa Takahashi, Akio Wakejima, Jun Suda
Summary: The study revealed that the epitaxial layer structure affects the electrical characteristics of AlGaN/GaN HEMTs. GaN-on-GaN HEMTs showed an improved tradeoff between maximum drain current and breakdown characteristics compared to GaN-on-SiC HEMTs. Moreover, the impact of Fe diffusion on frequency dispersion was relatively limited in GaN-on-GaN devices.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2022)
Article
Automation & Control Systems
Jiahui Sun, Jin Wei, Zheyang Zheng, Kevin J. Chen
Summary: This article characterizes the short circuit (SC) capability of 650-V Schottky-type p-GaN gate high-electron-mobility transistors (HEMTs) under single and repetitive tests. The devices exhibit strong capability under a single SC test, but weak capability under repetitive SC tests due to thermal fatigue cracks formed in the narrow GaN channel and buffer layers. The unique heat confinement effect in the GaN layer plays a crucial role in the formation of high temperature spike and fatigue cracks.
IEEE TRANSACTIONS ON INDUSTRIAL ELECTRONICS
(2021)
Article
Engineering, Electrical & Electronic
Sheng Li, Yanfeng Ma, Chi Zhang, Weihao Lu, Mengli Liu, Mingfei Li, Lanlan Yang, Siyang Liu, Jiaxing Wei, Long Zhang, Weifeng Sun, Jiaxin Sun
Summary: This letter introduces a new physics-based SPICE modeling method for the dynamic ON-state resistance (R-on,(dy)) of gallium nitride based p-type gate power high electron mobility transistors (p-GaN HEMTs). A time-resolved electron mobility variation (Delta mu(eff)) model is proposed to describe the continuous variations of Ron, dy. Physical parameters of traps in p-GaN HEMTs, including activation energy and voltage acceleration factor, are extracted as the model parameters. The proposed Delta mu(eff) model is incorporated into the surface potential based advanced SPICE model for GaN HEMT to simulate Ron, dy, and the simulative results confirm their effectiveness.
IEEE TRANSACTIONS ON POWER ELECTRONICS
(2023)
Article
Engineering, Electrical & Electronic
Chih-Yao Chang, Chien-Sheng Wang, Ching-Yao Wang, Yao-Luen Shen, Tian-Li Wu, Wei-Hung Kuo, Suh-Fang Lin, Chih-Fang Huang
Summary: This study demonstrates the performance of p-GaN/AlGaN/GaN HEMTs with ITO gate electrodes, showing excellent current and resistance characteristics. The robustness of the ITO gate electrode and its potential as a promising alternative technology for p-GaN HEMTs, compatible with LED processes, are highlighted in comparison to devices with Ni/Au Schottky gate contacts.
IEEE JOURNAL OF THE ELECTRON DEVICES SOCIETY
(2021)
Article
Computer Science, Information Systems
Tamiris Grossl Bade, Hassan Hamad, Adrien Lambert, Herve Morel, Dominique Planson
Summary: The instability of threshold voltage in p-GaN gate high electron mobility transistors (HEMTs) has been identified in recent years. This can cause reliability issues in switching applications and may be accompanied by other degradation mechanisms. In this study, a Vth measurement protocol originally established for SiC MOSFETs is applied to GaN HEMTs using the triple sense protocol, which involves preconditioning the transistor gate with voltage bias. Experimental results have confirmed that the proposed protocol enhances the stability of Vth measurement, even after experiencing degrading voltage bias stress on both drain and gate.
Article
Engineering, Electrical & Electronic
Ankit Soni, Mayank Shrivastava
Summary: This study investigated the impact of various charge sources on the electric field distribution and breakdown mechanism of HEMTs, revealing strong correlations between different charges and breakdown voltage. Insights were developed to explain the dependence of HEMT breakdown on surface states, polarization charge, and buffer traps, aiding in the design of efficient surface passivation schemes.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2021)
Article
Engineering, Electrical & Electronic
Yulei Jin, Feng Zhou, Weizong Xu, Zhengpeng Wang, Tianyang Zhou, Dong Zhou, Fangfang Ren, Yuanyang Xia, Leke Wu, Yiheng Li, Tinggang Zhu, Dunjun Chen, Rong Zhang, Jiandong Ye, Youdou Zheng, Hai Lu
Summary: In this work, high-V-TH p-GaN HEMTs with robust V-TH stability are demonstrated by p-GaN gate engineering via Mg doping and activation. The degradation rates of V-TH under stress conditions are significantly lower compared to conventional p-GaN HEMTs, thanks to the impact ionization-dependent hole compensation. Shallow and deep-level hole traps in the gate-stack of high-V-TH devices have also been identified.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2023)
Article
Chemistry, Analytical
Jun-Ho Lee, Jun-Hyeok Choi, Woo-Seok Kang, Dohyung Kim, Byoung-Gue Min, Dong Min Kang, Jung Han Choi, Hyun-Seok Kim
Summary: This study investigates the operational characteristics of AlGaN/GaN high-electron-mobility transistors (HEMTs) by using a slant-gate structure and drain-side extended field-plate (FP) to improve the breakdown voltage. The results show that the slant-gate structures can increase the breakdown voltage by up to 66% without compromising the frequency characteristics of the HEMT. Furthermore, when a drain-side extended FP is applied, the breakdown voltage can be further improved by up to 108%, but at the cost of deteriorated frequency characteristics. Therefore, AlGaN/GaN HEMTs with an optimized slant-gate-based structure can be a promising candidate for high-power and high-frequency applications.
Article
Chemistry, Analytical
Idriss Abid, Youssef Hamdaoui, Jash Mehta, Joff Derluyn, Farid Medjdoub
Summary: We report on the fabrication and electrical characterization of AlGaN/GaN normally off transistors on silicon designed for high-voltage operation. The normally off configuration was achieved with a p-gallium nitride (p-GaN) cap layer below the gate, enabling a positive threshold voltage higher than +1 V. The buffer structure was based on AlN/GaN superlattices (SLs), delivering a vertical breakdown voltage close to 1.5 kV with a low leakage current all the way to 1200 V.
Article
Engineering, Electrical & Electronic
Fangzhou Wang, Wanjun Chen, Xiaorui Xu, Ruize Sun, Zeheng Wang, Yun Xia, Yajie Xin, Chao Liu, Qi Zhou, Bo Zhang
Summary: The article proposes a dynamic charge storage mechanism for designing a p-GaN gate dynamic charge storage high-electron-mobility transistor (DCS-HEMT) with ultralow switching loss. The reduction of negative charges in the DCS layer during turn-on process accelerates the formation of electrons at the 2DEG channel, resulting in low turn-on loss (E-ON). The calibrated simulation shows that the total switching loss of the DCS-HEMT is 61% lower than that of the conventional p-GaN gate HEMT.
IEEE TRANSACTIONS ON ELECTRON DEVICES
(2021)
Article
Chemistry, Applied
Seungyoon Kang, Jongseob Kim, Joo-Hyoung Park, Chi Kyu Ahn, Chang-Houn Rhee, Min Su Han
Article
Chemistry, Physical
Jongseob Kim, Seung-Cheol Lee, Sung-Hoon Lee, Ki-Ha Hong
JOURNAL OF PHYSICAL CHEMISTRY C
(2015)
Article
Chemistry, Multidisciplinary
Hoon Ryu, Jongseob Kim, Ki-Ha Hong
Article
Chemistry, Physical
Jongseob Kim, Ki-Ha Hong
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
(2015)
Article
Chemistry, Physical
Ki-Ha Hong, Jongseob Kim, Lamjed Debbichi, Hyungjun Kim, Sang Hyuk Im
JOURNAL OF PHYSICAL CHEMISTRY C
(2017)
Article
Chemistry, Physical
Jongseob Kim, Choong-Heui Chung, Ki-Ha Hong
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
(2016)
Article
Chemistry, Physical
Jongseob Kim, Sung-Hoon Lee, Choong-Heui Chung, Ki-Ha Hong
PHYSICAL CHEMISTRY CHEMICAL PHYSICS
(2016)
Article
Nanoscience & Nanotechnology
Jongseob Kim, Hyungjun Kim, Mahesh Chandran, Seung-Cheol Lee, Sang Hyuk Im, Ki-Ha Hong
Article
Chemistry, Physical
Jongseob Kim, Kyung Yeon Kim, Hyoung Joon Choi, Ki-Ha Hong
JOURNAL OF PHYSICAL CHEMISTRY C
(2014)
Article
Chemistry, Physical
Jin Hyuck Heo, Jongseob Kim, Hyungjun Kim, Sang Hwa Moon, Sang Hyuk Im, Ki-Ha Hong
JOURNAL OF PHYSICAL CHEMISTRY LETTERS
(2018)
Article
Chemistry, Physical
Jongseob Kim, Sung-Hoon Lee, Sang Hyuk Im, Ki-Ha Hong
JOURNAL OF PHYSICAL CHEMISTRY LETTERS
(2020)
Article
Engineering, Electrical & Electronic
Injun Hwang, Soogine Chong, Younghwan Park, Sun-Kyu Hwang, Boram Kim, Joonyong Kim, Jaejoon Oh, Jun Hyuk Park, Dong-Chul Shin, Min Chul Yu, Jai Kwang Shin, Jongseob Kim
Summary: This study focuses on the transient measurement of the drift region potential in AlGaN/GaN HEMT under high power state, revealing that the propagation speed of high electric field in the device is influenced by the drift region voltage, and proposing that trapping of hot channel electrons is causing this effect.
IEEE ELECTRON DEVICE LETTERS
(2021)
Article
Materials Science, Multidisciplinary
Jaeho Kim, Jaejoon Oh, Jongseob Kim, Jaehee Cho
Summary: By depositing various dielectrics on the surfaces of AlGaN/GaN-based HEMT devices, it was observed that the 2DEG sheet carrier density increased by 30%, leading to improved device performance in terms of output and transfer characteristics. Additionally, the deposition of dielectrics helped suppress current collapse in the HEMT devices.
ECS JOURNAL OF SOLID STATE SCIENCE AND TECHNOLOGY
(2021)
Article
Engineering, Electrical & Electronic
Injun Hwang, Soogine Chong, Dong-Chul Shin, Sun-Kyu Hwang, Younghwan Park, Boram Kim, Joonyong Kim, Jaejoon Oh, Jun Hyuk Park, Min Chul Yu, Woochul Jeon, Jai Kwang Shin, Jongseob Kim
Summary: The research suggests using wafer level transient voltage measurement (WLTVM) to estimate the short circuit capability of AlGaN/GaNHEMT devices. The study found that short circuit failure is mainly attributed to degradation in the drift region. By measuring transient potential changes, it is possible to predict short circuit failures and take timely action.
IEEE ELECTRON DEVICE LETTERS
(2021)
Proceedings Paper
Engineering, Electrical & Electronic
Hoon Ryu, Jongseob Kim, Ki-Ha Hong
2014 INTERNATIONAL CONFERENCE ON SIMULATION OF SEMICONDUCTOR PROCESSES AND DEVICES (SISPAD)
(2014)