Atomic layer deposited zinc tin oxide channel for amorphous oxide thin film transistors
出版年份 2012 全文链接
标题
Atomic layer deposited zinc tin oxide channel for amorphous oxide thin film transistors
作者
关键词
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出版物
APPLIED PHYSICS LETTERS
Volume 101, Issue 11, Pages 113507
出版商
AIP Publishing
发表日期
2012-09-15
DOI
10.1063/1.4752727
参考文献
相关参考文献
注意:仅列出部分参考文献,下载原文获取全部文献信息。- Atomic layer deposition of tin oxide with nitric oxide as an oxidant gas
- (2012) Jaeyeong Heo et al. JOURNAL OF MATERIALS CHEMISTRY
- Improvement of the photo-bias stability of the Zn–Sn–O field effect transistors by an ozone treatment
- (2012) Bong Seob Yang et al. JOURNAL OF MATERIALS CHEMISTRY
- A study of the specific contact resistance and channel resistivity of amorphous IZO thin film transistors with IZO source–drain metallization
- (2011) Sunghwan Lee et al. JOURNAL OF APPLIED PHYSICS
- (Sn,Al)Ox Films Grown by Atomic Layer Deposition
- (2011) Jaeyeong Heo et al. Journal of Physical Chemistry C
- Low-temperature fabrication of high-performance metal oxide thin-film electronics via combustion processing
- (2011) Myung-Gil Kim et al. NATURE MATERIALS
- Amorphous indium zinc oxide thin film transistors with poly-4-vinylphenol gate dielectric layers
- (2011) Haifeng Pu et al. SEMICONDUCTOR SCIENCE AND TECHNOLOGY
- The status and perspectives of metal oxide thin-film transistors for active matrix flexible displays
- (2011) Jae Kyeong Jeong SEMICONDUCTOR SCIENCE AND TECHNOLOGY
- Review of recent developments in amorphous oxide semiconductor thin-film transistor devices
- (2011) Joon Seok Park et al. THIN SOLID FILMS
- Low Temperature Atomic Layer Deposition of Tin Oxide
- (2010) Jaeyeong Heo et al. CHEMISTRY OF MATERIALS
- Kinetics of Stop-Flow Atomic Layer Deposition for High Aspect Ratio Template Filling through Photonic Band Gap Measurements
- (2010) Siva Krishna Karuturi et al. Journal of Physical Chemistry C
- Present status of amorphous In–Ga–Zn–O thin-film transistors
- (2010) Toshio Kamiya et al. SCIENCE AND TECHNOLOGY OF ADVANCED MATERIALS
- Atomic Layer Deposition: An Overview
- (2009) Steven M. George CHEMICAL REVIEWS
- Area-Selective ALD with Soft Lithographic Methods: Using Self-Assembled Monolayers to Direct Film Deposition
- (2009) Xirong Jiang et al. Journal of Physical Chemistry C
- High performance solution-processed amorphous zinc tin oxide thin film transistor
- (2009) Seok-Jun Seo et al. JOURNAL OF PHYSICS D-APPLIED PHYSICS
- Area-Selective Atomic Layer Deposition Using Self-Assembled Monolayer and Scanning Probe Lithography
- (2009) Wonyoung Lee et al. JOURNAL OF THE ELECTROCHEMICAL SOCIETY
- Inkjet-Printed Zinc Tin Oxide Thin-Film Transistor
- (2009) Dongjo Kim et al. LANGMUIR
- Combinatorial study of zinc tin oxide thin-film transistors
- (2008) M. G. McDowell et al. APPLIED PHYSICS LETTERS
- Carrier concentration dependence of Ti∕Au specific contact resistance on n-type amorphous indium zinc oxide thin films
- (2008) Wantae Lim et al. APPLIED PHYSICS LETTERS
- Specific contact resistances between amorphous oxide semiconductor In–Ga–Zn–O and metallic electrodes
- (2007) Yasuhiro Shimura et al. THIN SOLID FILMS
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