Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect
出版年份 2021 全文链接
标题
Improved chemical mechanical polishing performance in 4H-SiC substrate by combining novel mixed abrasive slurry and photocatalytic effect
作者
关键词
Silicon carbide (SiC), Chemical mechanical polishing (CMP), Mixed abrasive slurry (MAS), Photocatalysis, High-energy ball milling (HEBM)
出版物
APPLIED SURFACE SCIENCE
Volume 575, Issue -, Pages 151676
出版商
Elsevier BV
发表日期
2021-10-29
DOI
10.1016/j.apsusc.2021.151676
参考文献
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