CMP behavior of alumina/metatitanic acid core–shell abrasives on sapphire substrates

出版年份 2017 全文链接

标题

作者

关键词

Chemical mechanical polishing (CMP), α-Al, 2, O, 3, /TiO(OH), 2, core–shell abrasives, Sapphire, Mechanism

出版物

Volume 50, Issue -, Pages 263-268

出版商

Elsevier BV

发表日期

2017-05-18

DOI

10.1016/j.precisioneng.2017.05.013

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