Study on Chemical Mechanical Polishing Performances of Sapphire Wafer (0001) Using Silica-Based Slurry

Preparation of Ce-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates

(2016) Hong Lei et al.   MATERIALS CHEMISTRY AND PHYSICS

Preparation of La-doped colloidal SiO2 composite abrasives and their chemical mechanical polishing behavior on sapphire substrates

(2016) Hong Lei et al.   PRECISION ENGINEERING-JOURNAL OF THE INTERNATIONAL SOCIETIES FOR PRECISION ENGINEERING AND NANOTECHNOLOGY

Effect of Abrasive Concentration on Chemical Mechanical Polishing of Sapphire

(2015) Wei-Xia Yan et al.   CHINESE PHYSICS LETTERS

A study of chemical products formed on sapphire (0001) during chemical–mechanical polishing

(2015) Xiaolei Shi et al.   SURFACE & COATINGS TECHNOLOGY

The Effect of pH on Sapphire Chemical Mechanical Polishing

(2015) W. Yan et al.   ECS Journal of Solid State Science and Technology

Additive-Driven Dissolution Enhancement of Colloidal Silica. 3. Fluorine-Containing Additives

(2012) Konstantinos D. Demadis et al.   INDUSTRIAL & ENGINEERING CHEMISTRY RESEARCH

Macroscopic and Microscopic Investigation on Chemical Mechanical Polishing of Sapphire Wafer

(2012) Hyunseop Lee et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Mechanism of the interaction between Al2O3 and SiO2 during the chemical-mechanical polishing of sapphire with silicon dioxide

(2012) E. A. Vovk et al.   Journal of Surface Investigation-X-Ray Synchrotron and Neutron Techniques

Effect of mechanical process parameters on friction behavior and material removal during sapphire chemical mechanical polishing

(2011) Zefang Zhang et al.   MICROELECTRONIC ENGINEERING

Two-Step Chemical Mechanical Polishing of Sapphire Substrate

(2010) Zefang Zhang et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY