Transparent and flexible capacitors based on nanolaminate Al2O3/TiO2/Al2O3

Transparent capacitors based on nanolaminate Al2O3/TiO2/Al2O3 with H2O and O3 as oxidizers

(2014) G. Z. Zhang et al.   APPLIED PHYSICS LETTERS

Microstructure optimization and optical and interfacial properties modulation of sputtering-derived HfO2 thin films by TiO2 incorporation

(2014) J.W. Zhang et al.   JOURNAL OF ALLOYS AND COMPOUNDS

High-performance self-aligned inversion-channel In0.53Ga0.47As metal-oxide-semiconductor field-effect-transistors by in-situ atomic-layer-deposited HfO2

(2013)   APPLIED PHYSICS LETTERS

Tailoring dielectric relaxation in ultra-thin high-dielectric constant nanolaminates for nanoelectronics

(2013) Geunhee Lee et al.   APPLIED PHYSICS LETTERS

Advanced high-k dielectric amorphous LaGdO3 based high density metal-insulator-metal capacitors with sub-nanometer capacitance equivalent thickness

(2013) S. P. Pavunny et al.   APPLIED PHYSICS LETTERS

Arsenic decapping and pre-atomic layer deposition trimethylaluminum passivation of Al2O3/InGaAs(100) interfaces

(2013) Jaesoo Ahn et al.   APPLIED PHYSICS LETTERS

Review on Atomic Layer Deposition and Applications of Oxide Thin Films

(2013) Joice Sophia Ponraj et al.   CRITICAL REVIEWS IN SOLID STATE AND MATERIALS SCIENCES

A review of fabrication and applications of carbon nanotube film-based flexible electronics

(2013) Steve Park et al.   Nanoscale

Flexible transparent conductive materials based on silver nanowire networks: a review

(2013) Daniel Langley et al.   NANOTECHNOLOGY

A Review of Carbon Nanotube- and Graphene-Based Flexible Thin-Film Transistors

(2013) Dong-Ming Sun et al.   Small

Oxide Semiconductor Thin-Film Transistors: A Review of Recent Advances

(2012) E. Fortunato et al.   ADVANCED MATERIALS

Low leakage current in metal-insulator-metal capacitors of structural Al2O3/TiO2/Al2O3 dielectrics

(2012) Jong-Chang Woo et al.   APPLIED PHYSICS LETTERS

Germanium surface passivation and atomic layer deposition of high-kdielectrics—a tutorial review on Ge-based MOS capacitors

(2012) Qi Xie et al.   SEMICONDUCTOR SCIENCE AND TECHNOLOGY

Design of Higher-k and More Stable Rare Earth Oxides as Gate Dielectrics for Advanced CMOS Devices

(2012) Yi Zhao   Materials

Comprehensive Study of Lanthanum Aluminate High-Dielectric-Constant Gate Oxides for Advanced CMOS Devices

(2012) Masamichi Suzuki   Materials

Improved reliability from a plasma-assisted metal-insulator-metal capacitor comprising a high-k HfO2 film on a flexible polyimide substrate

(2010) Jagan Singh Meena et al.   PHYSICAL CHEMISTRY CHEMICAL PHYSICS

Transparent Capacitor for the Storage of Electric Power Produced by Transparent Solar Cells

(2009) Cheng-Ji Xian et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Al-Doped TiO2 Films with Ultralow Leakage Currents for Next Generation DRAM Capacitors

(2008) Seong Keun Kim et al.   ADVANCED MATERIALS