Density functional theory study on the full ALD process of silicon nitride thin film deposition via BDEAS or BTBAS and NH3

Approaching the limits of dielectric breakdown for SiO2 films deposited by plasma-enhanced atomic layer deposition

(2013) Takane Usui et al.   ACTA MATERIALIA

Atomic Layer Deposition of SiO2 Thin Films Using Tetrakis(ethylamino)silane and Ozone

(2012) Jae-Kyung Kim et al.   JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY

Plasma-Assisted ALD for the Conformal Deposition of SiO2: Process, Material and Electronic Properties

(2012) G. Dingemans et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY

Non-heating atomic layer deposition of SiO2 using tris(dimethylamino)silane and plasma-excited water vapor

(2012) M. Degai et al.   THIN SOLID FILMS

Effect of Catalyst Layer Density and Growth Temperature in Rapid Atomic Layer Deposition of Silica Using Tris(tert-pentoxy)silanol

(2011) Seok-Jun Won et al.   ACS Applied Materials & Interfaces

On the Mechanisms of SiO2 Thin-Film Growth by the Full Atomic Layer Deposition Process Using Bis(t-butylamino)silane on the Hydroxylated SiO2(001) Surface

(2011) Bo Han et al.   Journal of Physical Chemistry C

Growth and electrical properties of silicon oxide grown by atomic layer deposition using Bis(ethyl-methyl-amino)silane and ozone

(2011) Seok-Jun Won et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

High-Quality Low-Temperature Silicon Oxide by Plasma-Enhanced Atomic Layer Deposition Using a Metal–Organic Silicon Precursor and Oxygen Radical

(2010) Seok-Jun Won et al.   IEEE ELECTRON DEVICE LETTERS

Structural, electronic and energetic properties of water adsorbed on β-Si3N4 (0001) surface: First-principles calculations

(2010) J. Nisar et al.   SURFACE SCIENCE

Atomic Layer Deposition: An Overview

(2009) Steven M. George   CHEMICAL REVIEWS

On the Dissociative Chemisorption of Tris(dimethylamino)silane on Hydroxylated SiO2(001) Surface

(2009) Jiaye Li et al.   Journal of Physical Chemistry C

Characterization of low-temperature silicon nitride films produced by inductively coupled plasma chemical vapor deposition

(2009) Q. Xu et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3

(2009) Kwangchol Park et al.   THIN SOLID FILMS

Bis(diethylamino) Silane as the Silicon Precursor in the Atomic Layer Deposition of HfSiO[sub x]

(2008) Rajesh Katamreddy et al.   JOURNAL OF THE ELECTROCHEMICAL SOCIETY