Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3

标题
Growth studies and characterization of silicon nitride thin films deposited by alternating exposures to Si2Cl6 and NH3
作者
关键词
-
出版物
THIN SOLID FILMS
Volume 517, Issue 14, Pages 3975-3978
出版商
Elsevier BV
发表日期
2009-02-05
DOI
10.1016/j.tsf.2009.01.118

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