Optical characteristics of H2O-based and O3-based HfO2 films deposited by ALD using spectroscopy ellipsometry
出版年份 2015 全文链接
标题
Optical characteristics of H2O-based and O3-based HfO2 films deposited by ALD using spectroscopy ellipsometry
作者
关键词
HfO2, Atomic Layer Deposition, Al2O3 Film, HfO2 Film, Valence Band Offset
出版物
APPLIED PHYSICS A-MATERIALS SCIENCE & PROCESSING
Volume 119, Issue 3, Pages 957-963
出版商
Springer Nature
发表日期
2015-02-17
DOI
10.1007/s00339-015-9048-9
参考文献
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