4.2 Article

Nanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations

Journal

ETRI JOURNAL
Volume 31, Issue 4, Pages 351-356

Publisher

WILEY
DOI: 10.4218/etrij.09.0109.0006

Keywords

Nanogap; freestanding nanowires; angle evaporation

Ask authors/readers for more resources

We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano-bio, electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap, arrays in single-electron transistors using DNA-linked Au nanoparticles for the detection of DNA hybridization.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.2
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available