4.2 Article

Nanogap Array Fabrication Using Doubly Clamped Freestanding Silicon Nanowires and Angle Evaporations

期刊

ETRI JOURNAL
卷 31, 期 4, 页码 351-356

出版社

WILEY
DOI: 10.4218/etrij.09.0109.0006

关键词

Nanogap; freestanding nanowires; angle evaporation

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We present a simple semiconductor process to fabricate nanogap arrays for application in molecular electronics and nano-bio, electronics using a combination of freestanding silicon nanowires and angle evaporation. The gap distance is modulated using the height of the silicon dioxide, the width of the Si nanowires, and the evaporation angle. In addition, we fabricate and apply the nanogap, arrays in single-electron transistors using DNA-linked Au nanoparticles for the detection of DNA hybridization.

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