Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment

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Title
Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment
Authors
Keywords
-
Journal
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 2, Pages G5
Publisher
The Electrochemical Society
Online
2007-12-22
DOI
10.1149/1.2812413

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