Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment

标题
Enhanced Nucleation Behavior of Atomic-Layer-Deposited Ru Film on Low-k Dielectrics Afforded by UV-O[sub 3] Treatment
作者
关键词
-
出版物
ELECTROCHEMICAL AND SOLID STATE LETTERS
Volume 11, Issue 2, Pages G5
出版商
The Electrochemical Society
发表日期
2007-12-22
DOI
10.1149/1.2812413

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