TiO[sub 2]∕Al[sub 2]O[sub 3]∕TiO[sub 2] Nanolaminated Thin Films for DRAM Capacitor Deposited by Plasma-Enhanced Atomic Layer Deposition

出版年份 2007 全文链接

标题

作者

关键词

出版物

Volume 11, Issue 2, Pages H19

出版商

The Electrochemical Society

发表日期

2007-12-22

DOI

10.1149/1.2813881

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