Precursor Adsorption on Copper Surfaces as the First Step during the Deposition of Copper: A Density Functional Study with van der Waals Correction

Published 2015 View Full Article

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Title
Precursor Adsorption on Copper Surfaces as the First Step during the Deposition of Copper: A Density Functional Study with van der Waals Correction
Authors
Keywords
-
Journal
Journal of Physical Chemistry C
Volume 119, Issue 17, Pages 9375-9385
Publisher
American Chemical Society (ACS)
Online
2015-04-08
DOI
10.1021/acs.jpcc.5b01402

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