Precursor Adsorption on Copper Surfaces as the First Step during the Deposition of Copper: A Density Functional Study with van der Waals Correction

标题
Precursor Adsorption on Copper Surfaces as the First Step during the Deposition of Copper: A Density Functional Study with van der Waals Correction
作者
关键词
-
出版物
Journal of Physical Chemistry C
Volume 119, Issue 17, Pages 9375-9385
出版商
American Chemical Society (ACS)
发表日期
2015-04-08
DOI
10.1021/acs.jpcc.5b01402

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