4.4 Article

Simple method for fabrication of microchannels in silicon carbide

Journal

JOURNAL OF LASER APPLICATIONS
Volume 27, Issue 2, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.2351/1.4906079

Keywords

microchannel; chemical etching; femtosecond laser; 6H-SiC

Funding

  1. National Basic Research Program of China (973 Program) [2012CB921804]
  2. National Natural Science Foundation of China (NSFC) [91123028, 61235003]
  3. Opened Fund of the State Key Laboratory on Integrated Optoelectronics [IOSKL2012KF]

Ask authors/readers for more resources

By using 800-nm femtosecond laser irradiation and chemical selective etching with hydrofluoric acid, microchannels are fabricated in silicon carbide. The diameter of the microchannel is about 1.5 mu m. The morphology of the channel is characterized by using scanning electronic microscopy equipped with an energy dispersive X-ray spectroscopy. The formation mechanism of silicon carbide channels is attributed to the formation of laser-induced structural change zones in silicon carbide and the reaction of the laser-induced structural change zones with hydrofluoric acid. In addition, the influences of the laser average power and scanning velocity on the position of the microchannel are discussed. (C) 2015 Laser Institute of America.

Authors

I am an author on this paper
Click your name to claim this paper and add it to your profile.

Reviews

Primary Rating

4.4
Not enough ratings

Secondary Ratings

Novelty
-
Significance
-
Scientific rigor
-
Rate this paper

Recommended

No Data Available
No Data Available