Strongly Reduced Si Surface Recombination by Charge Injection during Etching in Diluted HF/HNO3

Published 2012 View Full Article

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Title
Strongly Reduced Si Surface Recombination by Charge Injection during Etching in Diluted HF/HNO3
Authors
Keywords
-
Journal
CHEMPHYSCHEM
Volume 13, Issue 12, Pages 2982-2988
Publisher
Wiley
Online
2012-07-04
DOI
10.1002/cphc.201200269
References
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