HF-HNO3-H2SO4/H2O Mixtures for Etching Multicrystalline Silicon Surfaces: Formation of NO2+, Reaction Rates and Surface Morphologies

Title
HF-HNO3-H2SO4/H2O Mixtures for Etching Multicrystalline Silicon Surfaces: Formation of NO2+, Reaction Rates and Surface Morphologies
Authors
Keywords
-
Publisher
Walter de Gruyter GmbH
Online
2012-03-11
DOI
10.5560/znb.2011.66b0155

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started