Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition

Published 2013 View Full Article

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Title
Area Selective Growth of Titanium Diselenide Thin Films into Micropatterned Substrates by Low-Pressure Chemical Vapor Deposition
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 25, Issue 23, Pages 4719-4724
Publisher
American Chemical Society (ACS)
Online
2013-11-06
DOI
10.1021/cm402422e

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