Reduction of Electrical Defects in Atomic Layer Deposited HfO2Films by Al Doping

Published 2010 View Full Article

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Title
Reduction of Electrical Defects in Atomic Layer Deposited HfO2Films by Al Doping
Authors
Keywords
-
Journal
CHEMISTRY OF MATERIALS
Volume 22, Issue 14, Pages 4175-4184
Publisher
American Chemical Society (ACS)
Online
2010-06-28
DOI
10.1021/cm100620x

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