Reduction of Electrical Defects in Atomic Layer Deposited HfO2Films by Al Doping

标题
Reduction of Electrical Defects in Atomic Layer Deposited HfO2Films by Al Doping
作者
关键词
-
出版物
CHEMISTRY OF MATERIALS
Volume 22, Issue 14, Pages 4175-4184
出版商
American Chemical Society (ACS)
发表日期
2010-06-28
DOI
10.1021/cm100620x

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