Atomic Layer Deposition of MgF2Thin Films Using TaF5as a Novel Fluorine Source

标题
Atomic Layer Deposition of MgF2Thin Films Using TaF5as a Novel Fluorine Source
作者
关键词
-
出版物
CHEMISTRY OF MATERIALS
Volume 20, Issue 15, Pages 5023-5028
出版商
American Chemical Society (ACS)
发表日期
2008-06-21
DOI
10.1021/cm800948k

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