Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon

Published 2013 View Full Article

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Title
Low-Temperature Atomic Layer Deposition of Tungsten using Tungsten Hexafluoride and Highly-diluted Silane in Argon
Authors
Keywords
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Journal
CHEMICAL VAPOR DEPOSITION
Volume 19, Issue 4-6, Pages 161-166
Publisher
Wiley
Online
2013-05-31
DOI
10.1002/cvde.201307053
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