Effect of electrode spacing on the density distributions of electrons, ions, and metastable and radical molecules in SiH4/NH3/N2/He capacitively coupled plasmas

Ab initiochemical kinetics for reactions of H atoms with SiHx(x= 1-3) radicals and related unimolecular decomposition processes

(2013) Putikam Raghunath et al.   INTERNATIONAL JOURNAL OF QUANTUM CHEMISTRY

Plasma deposition in an ideal showerhead reactor: a two-dimensional analytical solution

(2012) A A Howling et al.   PLASMA SOURCES SCIENCE & TECHNOLOGY

Numerical modeling of SiH4 discharge for Si thin film deposition for thin film transistor and solar cells

(2011) Junghoon Joo   THIN SOLID FILMS

Atom-by-atom simulations of chemical vapor deposition of nanoporous hydrogenated silicon nitride

(2010) J. Houska et al.   JOURNAL OF APPLIED PHYSICS

Molecular dynamics for low temperature plasma–surface interaction studies

(2009) David B Graves et al.   JOURNAL OF PHYSICS D-APPLIED PHYSICS

Effects of interelectrode gap on high frequency and very high frequency capacitively coupled plasmas

(2009) Kallol Bera et al.   JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A

Hybrid Monte Carlo — Fluid model for studying the effects of nitrogen addition to argon glow discharges

(2008) Annemie Bogaerts   SPECTROCHIMICA ACTA PART B-ATOMIC SPECTROSCOPY