Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure
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Title
Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure
Authors
Keywords
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Journal
JOURNAL OF APPLIED PHYSICS
Volume 118, Issue 15, Pages 154305
Publisher
AIP Publishing
Online
2015-10-17
DOI
10.1063/1.4933288
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