Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure

Title
Determination of active doping in highly resistive boron doped silicon nanocrystals embedded in SiO2 by capacitance voltage measurement on inverted metal oxide semiconductor structure
Authors
Keywords
-
Journal
JOURNAL OF APPLIED PHYSICS
Volume 118, Issue 15, Pages 154305
Publisher
AIP Publishing
Online
2015-10-17
DOI
10.1063/1.4933288

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