In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

Title
In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 283, Issue -, Pages 234-239
Publisher
Elsevier BV
Online
2013-07-06
DOI
10.1016/j.apsusc.2013.06.091

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