In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition

标题
In situ spectroscopic ellipsometry study of TiO2 films deposited by plasma enhanced chemical vapour deposition
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 283, Issue -, Pages 234-239
出版商
Elsevier BV
发表日期
2013-07-06
DOI
10.1016/j.apsusc.2013.06.091

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