Modeling of altered layer formation during reactive ion etching of GaAs

Title
Modeling of altered layer formation during reactive ion etching of GaAs
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 263, Issue -, Pages 626-632
Publisher
Elsevier BV
Online
2012-10-07
DOI
10.1016/j.apsusc.2012.09.123

Ask authors/readers for more resources

Discover Peeref hubs

Discuss science. Find collaborators. Network.

Join a conversation

Ask a Question. Answer a Question.

Quickly pose questions to the entire community. Debate answers and get clarity on the most important issues facing researchers.

Get Started