Modeling of altered layer formation during reactive ion etching of GaAs

标题
Modeling of altered layer formation during reactive ion etching of GaAs
作者
关键词
-
出版物
APPLIED SURFACE SCIENCE
Volume 263, Issue -, Pages 626-632
出版商
Elsevier BV
发表日期
2012-10-07
DOI
10.1016/j.apsusc.2012.09.123

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