Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

Published 2009 View Full Article

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Title
Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering
Authors
Keywords
-
Journal
APPLIED SURFACE SCIENCE
Volume 255, Issue 22, Pages 9149-9153
Publisher
Elsevier BV
Online
2009-07-05
DOI
10.1016/j.apsusc.2009.06.126

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