Characteristics of N-doped TiO2 thin films grown on unheated glass substrate by inductively coupled plasma assisted dc reactive magnetron sputtering

出版年份 2009 全文链接

标题

作者

关键词

出版物

Volume 255, Issue 22, Pages 9149-9153

出版商

Elsevier BV

发表日期

2009-07-05

DOI

10.1016/j.apsusc.2009.06.126

Explore over 25,000 new funding opportunities and over 6,000,000 successful grants.

Explore

Discuss science. Find collaborators. Network.

Join a conversation