Ge-based interface passivation for atomic layer deposited La-doped ZrO2 on III-V compound (GaAs,In0.15Ga0.85As) substrates

Title
Ge-based interface passivation for atomic layer deposited La-doped ZrO2 on III-V compound (GaAs,In0.15Ga0.85As) substrates
Authors
Keywords
-
Journal
APPLIED PHYSICS LETTERS
Volume 95, Issue 2, Pages 023507
Publisher
AIP Publishing
Online
2009-07-18
DOI
10.1063/1.3182734

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