4.6 Article

Effects of well width and growth temperature on optical and structural characteristics of AlN/GaN superlattices grown by metal-organic chemical vapor deposition

Journal

APPLIED PHYSICS LETTERS
Volume 95, Issue 20, Pages -

Publisher

AMER INST PHYSICS
DOI: 10.1063/1.3267101

Keywords

aluminium compounds; gallium compounds; III-V semiconductors; MOCVD; photoluminescence; semiconductor growth; semiconductor superlattices; wide band gap semiconductors; X-ray diffraction

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AlN/GaN superlattices (SLs) employing various well widths (from 1.5 to 7.0 nm) are grown by metal-organic chemical vapor deposition technique at various growth temperatures (T(S)) (from 900 to 1035 degrees C). The photoluminescence (PL), x-ray diffraction, and intersubband (ISB) absorption characteristics of these SLs and their dependency on well width and growth temperature are investigated. Superlattices with thinner wells (grown at the same T(S)) or grown at lower T(S) (employing the same well width) are shown to demonstrate higher strain effects leading to a higher PL energy and ISB absorption energy. Simulations are employed to explain the experimental observations. ISB absorptions from 1.04 to 2.15 mu m are demonstrated via controlling well width and growth temperature.

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